Photoresist inks are formulated with photosensitive polymers that are coated onto a silicon wafer. Typical positive photoresist ink would contain the following ingredients:
Positive Photoresist 1
- Diazonaphthoquinone (photoactive compound)
- Novolac resin
- Stabilizer
- Polymerization inhibitors
- Viscosity control agent
- Dyes
- Plasticizers
- Solvents (EastaPure MAK, EastaPure PM Acetate, EastaPure n-Butyl Acetate, and EASTMAN EEP solvents have been used in photoresist ink formulations).
1 Information from SRI International "Electronic Chemicals" 1992
The photoresist inks after being coated onto the silicone wafer is dried and exposed to ultra violet light by a process called photolithography. This process allows pattern pathways to be developed for the microelectronic integrated circuits. Eastman provides high purity solvents called EastaPure Electronic Chemicals for producing uniform coatings on the silicone wafers. |