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| What is Wet Chemical Etching? |
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| Silicone and metals can be removed in a controlled etching process using high-purity inorganic acids. Inorganic acids such as nitric, hydrofluoric, hydrochloric, phosphoric, and sulfuric are commonly used for etching. A mixture of acids called mixed acid etchants (MAE) is used for controlled etching containing nitric, hydrofluoric and acetic acid. EastaPure Acetic Acid is used with the inorganic acid in this mixture.
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